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Investigation of conduction band structure, electron scattering mechanisms and phase transitions in indium selenide by means of transport measurements under pressure

机译:研究导带结构,电子散射   硒化铟的机理和相变通过运输   在压力下测量

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摘要

In this work we report on Hall effect, resistivity and thermopowermeasurements in n-type indium selenide at room temperature under eitherhydrostatic and quasi-hydrostatic pressure. Up to 40 kbar (= 4 GPa), thedecrease of carrier concentration as the pressure increases is explainedthrough the existence of a subsidiary minimum in the conduction band. Thisminimum shifts towards lower energies under pressure, with a pressurecoefficient of about -105 meV/GPa, and its related impurity level trapselectrons as it reaches the band gap and approaches the Fermi level. Thepressure value at which the electron trapping starts is shown to depend on theelectron concentration at ambient pressure and the dimensionality of theelectron gas. At low pressures the electron mobility increases under pressurefor both 3D and 2D electrons, the increase rate being higher for 2D electrons,which is shown to be coherent with previous scattering mechanisms models. Thephase transition from the semiconductor layered phase to the metallic sodiumcloride phase is observed as a drop in resistivity around 105 kbar, but above40 kbar a sharp nonreversible increase of the carrier concentration isobserved, which is attributed to the formation of donor defects as precursorsof the phase transition.
机译:在这项工作中,我们报告了在室温下在静水压力和准静水压力下n型硒化铟的霍尔效应,电阻率和热功率测量结果。高达40 kbar(= 4 GPa),通过在导带中存在次要极小值来解释随着压力增加,载流子浓度的降低。该最小值在压力下朝着较低的能量移动,压力系数约为-105 meV / GPa,并且在到达带隙并接近费米能级时,其相关的杂质能级会俘获选择子。显示出电子俘获开始的压力值取决于环境压力下的电子浓度和电子气体的尺寸。在低压下,对于3D和2D电子,电子迁移率都在压力下增加,对于2D电子,其增加速率更高,这表明与以前的散射机理模型是一致的。观察到从半导体层状相到金属氯化钠相的相变是电阻率在105 kbar附近下降,但在40 kbar以上观察到载流子浓度急剧不可逆地增加,这归因于作为相变前体的施主缺陷的形成。

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